Maskless Aligner System

The University of Calgary (UCalgary) intends to purchase the MLA 150 System from Spectra Research Corporation, the sole authorized Canadian representative of Heidelberg Instruments for this system. UCalgary’s qLab requires a direct-write maskless lithography system that can support multi-user semiconductor cleanroom operations and the fabrication of quantum devices on a range of substrates, including transparent and challenging materials such as fabrication on diamond. The required system must provide maskless lithography with a minimum feature size of 1 μm, dual laser wavelengths of 405 nm and 375 nm to support required photoresist compatibility, real-time autofocus capability for transparent, patterned, warped, or delicate substrates, and sufficient throughput for cleanroom use. Based on the technical assessment completed by qLab, the MLA 150 Maskless Aligner System is the only known system currently capable of meeting these required functional and technical capabilities, and Spectra Research Corporation is the only authorized Canadian vendor for this system.