| Location: | Maryland |
|---|---|
| Posted: | Nov 21, 2024 |
| Due: | Dec 6, 2024 |
| Agency: | COMMERCE, DEPARTMENT OF |
| Type of Government: | Federal |
| Category: |
|
| Solicitation No: | NIST-SS25-CHIPS-0030 |
| Publication URL: | To access bid details, please log in. |
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BACKGROUND
Semiconductor manufacturing yield enhancement requires ongoing risk analysis of cleaning chemical purity wherein critical contaminants are already at levels difficult or impossible to detect, let alone identify and quantify. Next generation chips will require even purer materials and advanced metrological capabilities for the detection, identification, and quantification of impurities in semiconductor cleaning chemicals necessitating a practical roadmap for assessing material purity commensurate with the needs of the next generation in semiconductor manufacturing.
One exemplary system of study is ultra-pure water (UPW) as semiconductor fabrication plants (fabs) can utilize upwards of 3.4 × 107 L d-1 (9 × 106 gal d-1 or ≈ 14 Olympic-size swimming pools) of UPW, and it is used in all wet-processing steps where, to a large extent, the cleanliness, and hence yield, of a wafer is determined by the purity of the water. Further, the International Roadmap for Devices and Systems (IRDS) has identified that a “Lack of proven particle metrology limits the ability to confirm whether UF (ultrafiltration of UPW) is effective in controlling killer size particles down to the critical particle size”.
One component of the proposed testing is to identify candidate test materials for challenging the efficiency of ultrafiltration (UF) systems. Preparation of these test materials would ideally utilize a special grade of ultrapure water (UPW0) that is at least an order of magnitude purer than the contaminant limits specified in IRDS-YE 2021 of 3 nm. Having this level of water purity allows for preconcentration research to be conducted and test materials to be prepared. To achieve the necessary purity, the UPW generated by the industry standard practice of reverse osmosis, ion exchange, and ultrafiltration will be further purified by sub-boiling distillation, which is based on an orthogonal purification principle.
Specifically, we require a sub-boiling distiller capable of producing UPW0 from UPW.
NIST is seeking information from sources that may be capable of providing a solution that will achieve the objectives described above, in addition to the following essential requirements:
Line Item 0001: Sub-boiling distiller
Description: Distillation unit for purifying ultrapure water.
Quantity: 1
HOW TO RESPOND TO THIS NOTICE
In responding to this notice, please DO NOT PROVIDE PROPRIETARY INFORRMATION. Please include only the following information, readable in either Microsoft Word 365, Microsoft Excel 365, or .pdf format, in the response: Submit the response by email to the Primary Point of Contact and, if specified, to the Secondary Point of Contact specialist listed at the bottom of this notice as soon as possible, and preferably before the closing date and time of this notice.
QUESTIONS REGARDING THIS NOTICE
Questions regarding this notice may be submitted via email to the Primary Point of Contact and the Secondary Point of Contact listed in this notice. Questions should be submitted so that they are received 5 days prior to the expiration of this notice. Questions will be anonymized and answered via sources sought notice amendment following the question submission deadline.
IMPORTANT NOTES
The information received in response to this notice will be reviewed and considered so that NIST may appropriately solicit for its requirements in the near future.
This notice should not be construed as a commitment by NIST to issue a solicitation or ultimately award a contract.
Responses will not be considered as proposals or quotations.
No award will be made as a result of this notice.
NIST is not responsible for any costs incurred by the respondents to this notice.
NIST reserves the right to use information provided by respondents for any purpose deemed necessary and appropriate.
Thank you for taking the time to submit a response to this request!

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