Primary S-Parameter Standards for Plasma Etching Record
| Location: | Maryland |
|---|---|
| Posted: | May 23, 2026 |
| Agency: | COMMERCE, DEPARTMENT OF |
| Type of Contract: | Awards |
| Type of Government: | Federal |
| Category: |
|
| Solicitation No: | 1333ND26QNB030097 |
| Publication URL: | To access bid details, please log in. |
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Active
Contract Opportunity
Notice ID
1333ND26QNB030097
Related Notice
1333ND26QNB030097
Contract Line Item Number
Department/Ind. Agency
COMMERCE, DEPARTMENT OF
Sub-tier
NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
Office
DEPT OF COMMERCE NIST
Award Details
General Information
Classification
Description
Contact Information
History
- Contract Award Date: May 05, 2026
- Contract Award Number: 1333ND26PNB030117
- Task/Delivery Order Number:
- Contractor Awarded Unique Entity ID: SMFHE5KKART8
- Contractor Awarded Name: SPINNER ICT INC
- Contractor Awarded Address: Duluth , GA 30096 USA
- Base and All Options Value (Total Contract Value): $98,000.00
- Contract Opportunity Type: Award Notice (Original)
- Original Published Date: May 22, 2026 11:29 am EDT
- Inactive Policy: Manual
- Original Inactive Date: Jun 01, 2026
-
Initiative:
- None
- Original Set Aside:
- Product Service Code: 6640 - LABORATORY EQUIPMENT AND SUPPLIES
-
NAICS Code:
- 334516 - Analytical Laboratory Instrument Manufacturing
-
Place of Performance:
Gaithersburg , MD 20899USA
Attachments/Links
Contracting Office Address
- ACQUISITION MANAGEMENT DIVISION 100 BUREAU DR.
- GAITHERSBURG , MD 20899
- USA
Primary Point of Contact
- Ranae M. Armstrong
- ranae.armstrong@nist.gov
Secondary Point of Contact
- Donald Collie
- donald.collie@nist.gov
- May 23, 2026 12:08 am EDT Combined Synopsis/Solicitation (Updated)
- May 22, 2026 11:29 am EDTAward Notice (Original)
Related Document
| Mar 9, 2026 | [Combined Synopsis/Solicitation (Updated)] Primary S-Parameter Standards for Plasma Etching Record |
| Mar 11, 2026 | [Combined Synopsis/Solicitation (Updated)] Primary S-Parameter Standards for Plasma Etching Record |
| Oct 7, 2026 | [Award Notice (Updated)] Primary S-Parameter Standards for Plasma Etching Record |
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