Photolithography Exposure System

Location: Maryland
Posted: Sep 19, 2025
Agency: DEPT OF DEFENSE
Type of Contract: Awards
Type of Government: Federal
Category:
  • 36 - Special Industry Machinery
Solicitation No: HT942525PE042
Publication URL: To access bid details, please log in.
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Photolithography Exposure System
Active
Contract Opportunity
Notice ID
HT942525PE042
Related Notice
Contract Line Item Number
HT942525PE042
Department/Ind. Agency
DEPT OF DEFENSE
Sub-tier
DEFENSE HEALTH AGENCY (DHA)
Office
ARMY MED RES ACQ ACTIVITY
Award Details
  • Contract Award Date: Sep 18, 2025
  • Contract Award Number: HT942525PE042
  • Task/Delivery Order Number:
  • Contractor Awarded Unique Entity ID: UB7PM2A1F9A1
  • Contractor Awarded Name: HEIDELBERG INSTRUMENTS INC.
  • Contractor Awarded Address: Torrance , CA 90505 USA
  • Base and All Options Value (Total Contract Value): $160,700.00
General Information
  • Contract Opportunity Type: Award Notice (Original)
  • Original Published Date: Sep 19, 2025 10:05 am EDT
  • Inactive Policy: 15 days after contract award date
  • Original Inactive Date: Oct 03, 2025
  • Initiative:
    • None
Classification
  • Original Set Aside: Total Small Business Set-Aside (FAR 19.5)
  • Product Service Code: 3670 - SPECIALIZED SEMICONDUCTOR, MICROCIRCUIT, AND PRINTED CIRCUIT BOARD MANUFACTURING MACHINERY
  • NAICS Code:
    • 333242 - Semiconductor Machinery Manufacturing
  • Place of Performance:
    Gunpowder , MD 21010
    USA
Description

The U.S. Army Medical Research Institute of Chemical Defense (USAMICD) requires a photolithography exposure system which could be a mask aligner or a direct laser writer (also known as a “maskless” aligner). It shall have a UV light source that passes light through an inserted photomask onto a substrate coated in photoresist. The system shall be able to align this projected pattern precisely with the substrate being exposed. The UV light wavelength shall be compatible with SU-8 photoresist (365nm). Operating parameters shall be digitally controlled with a programmable logic controller system or included computer. Created patterns shall be repeatable with a resolution of 2 microns or less. The system shall be able to expose an area up to and including that of a standard 6” wafer. It shall be capable of both soft and hard contact exposure. The system will be used for prototyping electrode designs with precise features. It should not require a clean room to operate.


Attachments/Links
Contact Information
Contracting Office Address
  • 808 SCHREIDER ST
  • FORT DETRICK , MD 21702
  • USA
Primary Point of Contact
Secondary Point of Contact
History
  • Sep 19, 2025 10:05 am EDTAward Notice (Original)
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