| Location: | Federal |
|---|---|
| Posted: | Jun 3, 2025 |
| Due: | Jul 3, 2025 |
| Agency: | DEPT OF DEFENSE |
| Type of Government: | Federal |
| Category: |
|
| Solicitation No: | N0017325Q0006 |
| Publication URL: | To access bid details, please log in. |
APEX Accelerators are an official government contracting resource for small businesses. Find your local APEX Accelerator (opens in new window) for free government expertise related to contract opportunities.
APEX Accelerators are funded in part through a cooperative agreement with the Department of Defense.
The APEX Accelerators program was formerly known as the Procurement Technical Assistance Program (opens in new window) (PTAP).
This Request for Quote (RFQ) is for the procurment of a Photoresist Direect Write Lithography System as described in Attachment 1 of this solicitation.
This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in Federal Acquisition Regulations (FAR) Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. Solicitation documents and incorporated provisions are those in effect through Federal Acquisition Circular 2021-06 and NMCARS 18-18.
All changes to this solicitation that occur prior to the closing date will be issued via amendment posted to the announcement on Contract Opportunities (beta.sam.gov). It is the responsibility of interested vendors to monitor the announcement for amendments that may be issued to this solicitation. For changes made after the closing date, only those quoters that provide a quote will be provided any changes/amendments and considered for future discussions and/or award.
Questions must be submitted to the Point(s) of Contact listed no later than ten (10) days after the Posted Date.
| Jun 25, 2025 | [Combined Synopsis/Solicitation (Updated)] Photoresist Direct Write Lithography System |
| Aug 29, 2025 | [Award Notice (Original)] Photoresist Direct Write Lithography System |

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