| Location: | Maryland |
|---|---|
| Posted: | Nov 19, 2024 |
| Due: | Dec 3, 2024 |
| Agency: | COMMERCE, DEPARTMENT OF |
| Type of Government: | Federal |
| Category: |
|
| Solicitation No: | NIST-SS25-CHIPS-0027 |
| Publication URL: | To access bid details, please log in. |
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NIST-SS25-CHIPS-0027
Title: High-pressure XPS System
The purpose of this sources sought notice is to conduct market research and identify potential sources of commercial products/services that satisfy the Government’s anticipated needs.
BACKGROUND
Advanced in situ and operando methods for real-time monitoring of the chemical status of wafer surfaces, thin films, and interfaces are essential for semiconductor process development and control. NIST is seeking information from sources that may be capable of providing a commercial item solution that meets or exceeds the criteria below.
The required setup consists of a differentially pumped μ-metal shielded Ambient-Pressure (AP) XPS spectrometer (also denoted as Near-Ambient-Pressure (NAP)) equipped with 2D electron detector and X-ray source capable of providing an intense, focused X-ray beam to the sample under elevated pressures. Both the APXPS analyzer and X-ray source are connected to the custom-made reaction chamber made of non-magnetic materials, where the elevated-pressure reactive environment is maintained. The pressure in the reaction chamber varies from UHV to a few Torr, and its gaseous composition includes (but is not limited to) N2, He, H2, Ar, O2, CH4, CF4, and H2O and their mixtures. The reaction chamber has its own pumping system and controls.
AP(NAP) XPS analyzer operates under the above-specified pressure conditions, providing at least a few kcps Ag 3d5/2 count rate at a few Torr pressures from the Ag test sample exited by a designated Al Kα X-ray source. As large as possible: the working distance of the analyzer, electron kinetic energy range (typically 20 eV to 1500 eV and beyond), as well as the highest spectral and spatial resolution, are required.
The designated X-ray source is equipped with a highly X-ray transparent membrane window that can withstand the pressure differential with the reaction chamber. The source provides highly focused monochromatized Al Kα excitation with a resolution better than 250 meV, variable spot size in the order of 1 mm or smaller, and flux higher than 1010 ph/s. The larger distance between the sample and the membrane X-ray window is preferred.
The APXPS analyzer and X-ray source are equipped with differential pumping systems (which are optional and need to be quoted).
The APXPS analyzer, X-ray source, and differential pumping systems are equipped with control electronics, cables, power supplies, close-cycle cooling systems (where necessary), and corresponding software, including data acquisition software.
HOW TO RESPOND TO THIS NOTICE
In responding to this notice, please DO NOT PROVIDE PROPRIETARY INFORRMATION. Please include only the following information, readable in either Microsoft Word 365, Microsoft Excel 365, or .pdf format, in the response: Submit the response by email to the Primary Point of Contact and, if specified, to the Secondary Point of Contact specialist listed at the bottom of this notice as soon as possible, and preferably before the closing date and time of this notice.
QUESTIONS REGARDING THIS NOTICE
Questions regarding this notice may be submitted via email to the Primary Point of Contact and the Secondary Point of Contact listed in this notice. Questions should be submitted so that they are received by 12:00 PM Eastern Time on November 21, 2024. Questions will be anonymized and answered via sources sought notice amendment following the question submission deadline.
IMPORTANT NOTES
The information received in response to this notice will be reviewed and considered so that NIST may appropriately solicit for its requirements in the near future.
This notice should not be construed as a commitment by NIST to issue a solicitation or ultimately award a contract.
Responses will not be considered as proposals or quotations.
No award will be made as a result of this notice.
NIST is not responsible for any costs incurred by the respondents to this notice.
NIST reserves the right to use information provided by respondents for any purpose deemed necessary and appropriate.
Thank you for taking the time to submit a response to this request.

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