Inductively Coupled Plasma Deep Reactive Ion Etch
| Location: |
Federal |
| Posted: |
Sep 26, 2025 |
| Agency: |
DEPT OF DEFENSE |
| Type of Contract: |
Awards |
| Type of Government: |
Federal |
| Category: |
- 36 - Special Industry Machinery
|
| Solicitation No: |
N0017325P0063 |
| Publication URL: |
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Inductively Coupled Plasma Deep Reactive Ion Etch
Active
Contract Opportunity
Contract Line Item Number
Department/Ind. Agency
DEPT OF DEFENSE
Sub-tier
DEPT OF THE NAVY
Major Command
ONR
Sub Command
ONR NRL
Office
NAVAL RESEARCH LABORATORY
Award Details
General Information
-
Contract Opportunity Type: Award Notice (Original)
-
Original Published Date: Sep 26, 2025 02:20 pm EDT
-
Inactive Policy: 15 days after contract award date
-
Original Inactive Date:
Oct 10, 2025
-
Initiative:
Classification
-
Original Set Aside: No Set aside used
-
Product Service Code: 3670 - SPECIALIZED SEMICONDUCTOR, MICROCIRCUIT, AND PRINTED CIRCUIT BOARD MANUFACTURING MACHINERY
-
NAICS Code:
-
333242 - Semiconductor Machinery Manufacturing
-
Place of Performance:
USA
Description
The awarded contract is a non-competitive, firm-fixed price award to the awardee specified.
Attachments/Links
Contact Information
Contracting Office Address
-
4555 OVERLOOK AVE SW
-
WASHINGTON , DC 20375-5328
-
USA
Secondary Point of Contact
History
-
Sep 26, 2025 02:20 pm EDTAward Notice (Original)
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