| Location: | Maryland |
|---|---|
| Posted: | Mar 11, 2026 |
| Due: | Mar 25, 2026 |
| Agency: | COMMERCE, DEPARTMENT OF |
| Type of Government: | Federal |
| Category: |
|
| Solicitation No: | NIST-SS26-CHIPS-83 |
| Publication URL: | To access bid details, please log in. |
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BACKGROUND
Semiconductor manufacturing yield enhancement requires ongoing risk analysis of cleaning chemical purity wherein critical contaminants are already at levels difficult or impossible to detect, let alone identify and quantify. Next-generation chips will require even purer materials and advanced metrological capabilities for the detection, identification, and quantification of impurities in semiconductor cleaning chemicals, necessitating a practical roadmap for assessing material purity commensurate with the needs of the next generation in semiconductor manufacturing.
The purification of water to ultrapure water is a critical process in various semiconductor and research applications, where even trace amounts of contaminants at the parts-per-billion level (ppb, 10-9 moles per mole) can compromise the integrity of the water and affect downstream processes. High molecular weight organics (a particle precursor), metallic ions and native particles can all impact chip reliability and yield at these low concentrations. Current laboratory grade ultrapure water sources using reverse osmosis, ion exchange, and ultrafiltration can readily obtain water purities with contaminants at the ppb level. However, the development of test materials requires significantly reduced contaminant concentrations of 10 to 100 parts-per-trillion (ppt, 10-12 moles per mole). Artifact based standards require even further reduced contamination concentrations approaching the 10’s of parts-per-quadrillion (ppq, 10-15 moles per mole). The proposed method for producing this new grade of UPW, referred to as UPW0, is to further purify UPW using sub-boiling distillation in a controlled environment (i.e., glove box). The sub-boiling distillation process greatly reduces contamination carryover, versus traditional distillation, while the glove box reduces interferences from ambient molecular and particulate contaminants.
Specifically, we require a sub-boiling distiller to further purify ultrapure water for test material and standards development.
NIST is seeking information from sources that may be capable of providing a solution that will achieve the objectives described above, in addition to the following essential requirements:
Line Item 0001: Sub-boiling distiller
Description: Sub-boiling distillation system.
Quantity: 1
HOW TO RESPOND TO THIS NOTICE
In responding to this notice, please DO NOT PROVIDE PROPRIETARY INFORRMATION. Please include only the following information, readable in either Microsoft Word 365, Microsoft Excel 365, or .pdf format, in the response: Submit the response by email to the Primary Point of Contact and, if specified, to the Secondary Point of Contact specialist listed at the bottom of this notice as soon as possible, and preferably before the closing date and time of this notice.
QUESTIONS REGARDING THIS NOTICE
Questions regarding this notice may be submitted via email to the Primary Point of Contact and the Secondary Point of Contact listed in this notice. Questions should be submitted so that they are received 5 days prior to the expiration of this notice. Questions will be anonymized and answered via sources sought notice amendment following the question submission deadline.
IMPORTANT NOTES
The information received in response to this notice will be reviewed and considered so that NIST may appropriately solicit for its requirements in the near future.
This notice should not be construed as a commitment by NIST to issue a solicitation or ultimately award a contract.
Responses will not be considered as proposals or quotations.
No award will be made as a result of this notice.
NIST is not responsible for any costs incurred by the respondents to this notice.
NIST reserves the right to use information provided by respondents for any purpose deemed necessary and appropriate.
Thank you for taking the time to submit a response to this request!

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